What’s new? Join our spring workshops!
Our spring workshop series is discussing various strategic and legal aspects of IPR Management - starting with a workshop on use requirements concerning registered trade marks in the EU and Germany, followed by a workshop on a recent court decision in China.
Dennemeyer invites you to our Workshop „Sichere Marken – Nutzungszwang und Benutzungsnachweis“, 15 March 2017 in Munich.
Speaker: Sabrina Machei, Dennemeyer & Associates S.A.
Proof of use must show 'genuine use' of the trade mark during the relevant five year period. The volume of trade does not necessarily have to be high but it must be serious. Therefore proof of use usually includes copies of a range of invoices and VAT receipts, price lists, advertisements, product packaging, sales figures etc. All evidence must refer to the trade mark concerned, and all printed material should show the publication date. The workshop will show how to manage this in a profound manner!
As with many legal matters in business, an ounce of prevention is worth a pound of cure.
Dennemeyer invites you to our Workshop „Outsourcing manufacturing to China: Is there a trademark trap?“, 29 March 2017 in Munich.
Speaker: Lizhou Wei
Original equipment manufacturers producing in China should be aware of potential risks emerging from their own trade mark, but registered in China in a third party’s name. Our second evening lecture on Chinese IP law and practice will therefore discuss Supreme Court’s ruling in the PRETUL case, subsequent important decisions and judicial trends and possibilities to avoid trade mark traps.
Speaker: Anna Forestan, Dennemeyer & Co. GmbH
Intellectual Property & Data Protection: What do you need to know about the GDPR?
Date: 6 April 2017
Speakers: Dr. Sevim Süzeroglu-Melchiors and Philipp Hammans, Dennemeyer Consulting GmbH
Study: The future of Intellectual Property
Date: 25 April 2017
This month's Intellectual Property (IP) news highlights the importance and challenges of protecting core patents, trademarks and trade secrets.